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Naslov: Resilient Growth of Highly Crystalline Topological Insulator-Superconductor Heterostructure Enabled by Ex-situ Nitride Film
Vir:

arXiv.org [2331-8422] Ge, Min l. 2024,

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  Testni dostop do 10. decembra 2018

  Dostopno iz prostorov UL, CTK, NIB in NUK.




 
 
 

 
 
 


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