|
|
SFX by Ex Libris Inc.
|
List of services to meet your request
|
||||||||||
|
||||||||||
© 2024 SFX by Ex Libris Inc. | Cookie Policy
CrossRef Omogočeno
![](https://beacon01.alma.exlibrisgroup.com/boom/apache_pb.gif?SRVR=adz.izum.si&IP=193.2.126.232&A=SFX&P=SFXMenu&S=s99EC5674-594B-11EF-B0D0-9DFA84CE164B&I=39IZM&T=&OP=Display&O=html&O1=14978961&O2=4100000011940825&O3=&O4=summon.serialssolutions.com&O5=https%3A%2F%2Fadz.izum.si%2Fsfxlcl41%3Fctx_enc%3Dinfo%253Aofi%252Fenc%253AUTF-8%26ctx_ver%3DZ39.88-2004%26rfr_id%3Dinfo%253Asid%252Fsummon.serialssolutions.com%26rft.atitle%3DStudy%2520of%2520Plasma%2520Ash%2520Rate%2520Enhancement%2520by%2520Machine%2520Learning%2520Models%2520for%2520TAT%2520Improvement%26rft.au%3DChiu%252C%2520Yuan-Chieh%26rft.au%3DJheng%252C%2520Shao-Lou%26rft.au%3DWu%252C%2520Jyunhong%26rft.au%3DYang%252C%2520Zusing%26rft.date%3D2021-05-10%26rft.eissn%3D2376-6697%26rft.epage%3D4%26rft.externalDocID%3D9774980%26rft.genre%3Dproceeding%26rft.pub%3DIEEE%26rft.spage%3D1%26rft.title%3D2021%252032nd%2520Annual%2520SEMI%2520Advanced%2520Semiconductor%2520Manufacturing%2520Conference%2520%2528ASMC%2529%26rft_id%3Dinfo%253Adoi%252F10.1109%252FASMC51741.2021.9774980%26rft_val_fmt%3Dinfo%253Aofi%252Ffmt%253Akev%253Amtx%253Abook&O6=1-IEEE_ELECTRONIC_LIBRARY_IEL_UL_LCL-getFullTxt-object,2-IEEE_ELECTRONIC_LIBRARY_IEL_UM_LCL-getFullTxt-object,3-IEEE_ELECTRONIC_LIBRARY_IEL_CONFERENCE_PROCEEDINGS_UL_LCL-getFullTxt-object,4-IEEE_ELECTRONIC_LIBRARY_IEL_CONFERENCE_PROCEEDINGS_UM_LCL-getFullTxt-object,5-DOI-getDOI-object,6-COBIB_SI_LCL-getHolding-object,7-AMAZON_FREE-getBookReview-object,8-REFWORKS_EXPORT_TOOL-getReference-object,9-GOOGLE_BOOK_SEARCH-getWebSearch-object,10-GOOGLE_SCHOLAR_FREE-getWebSearch-object,11-WWW_SEARCH_ENGINES_FREE-getWebSearch-object&O7=0.92559&O8=N&O9=<ctx:context-object identifier="urn:sfxstat:14978961-s99EC5674-594B-11EF-B0D0-9DFA84CE164B" timestamp="2024-08-13T10:11:11Z" xmlns:ctx="info:ofi/fmt:xml:xsd:ctx">
<ctx:referent>
<ctx:identifier>urn:sfxid:4100000011940825</ctx:identifier>
<ctx:metadata-by-val>
<ctx:format>info:ofi/fmt:xml:xsd:journal</ctx:format>
<ctx:metadata>
<jnl:journal xmlns:jnl="info:ofi/fmt:xml:xsd:journal">
<jnl:atitle>Study of Plasma Ash Rate Enhancement by Machine Learning Models for TAT Improvement</jnl:atitle>
<jnl:jtitle>2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)</jnl:jtitle>
<jnl:date>2021-05-10</jnl:date>
<jnl:spage>1</jnl:spage>
<jnl:epage>4</jnl:epage>
<jnl:genre>proceeding</jnl:genre>
<jnl:eissn>2376-6697</jnl:eissn>
<jnl:language>eng</jnl:language>
<jnl:authors></jnl:authors>
</jnl:journal>
</ctx:metadata>
</ctx:metadata-by-val>
</ctx:referent>
<ctx:requester>
<ctx:identifier>urn:ip:4788e8d15d3ffaa15cecfdd381814c23f6812eb3</ctx:identifier>
<ctx:identifier>urn:UUID:s99EC5674-594B-11EF-B0D0-9DFA84CE164B</ctx:identifier>
</ctx:requester>
<ctx:referrer>
<ctx:identifier>info:sid/summon.serialssolutions.com</ctx:identifier>
</ctx:referrer>
<ctx:service-type>
<ctx:metadata-by-val>
<ctx:format>info:ofi/fmt:xml:xsd:svcList</ctx:format>
<ctx:metadata>
<svc:svcList xmlns:svc="http://www.exlibrisgroup.com/schema/info:ofi/fmt:xml:xsd:sch_svc"></svc:svcList>
</ctx:metadata>
</ctx:metadata-by-val>
</ctx:service-type>
<ctx:resolver>
<ctx:identifier>https://adz.izum.si/sfxlcl41</ctx:identifier>
</ctx:resolver>
</ctx:context-object>
&)