|
|
SFX by Ex Libris Inc. |
Contains information about title and source of a journal
Naslov: |
Sub-0.5 nm equivalent oxide thickness scaling for Si-doped Zr1-xHfxO2 thin film without using noble metal electrode |
Vir: |
|
|
|
List of services to meet your request
Contains list of services for current record
|
|
|
© 2024 SFX by Ex Libris Inc. | Cookie Policy
CrossRef Omogočeno
|